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Ion implantation in semiconductors : proceedings of the II. International Conference on Ion Implantation in Semiconductors, Physics and Technology, Fundamental and Applied Aspects, May 24-28, 1971, Garmisch-Partenkirchen, Bavaria, Germany

Ingolf Rüge, J. Graul

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Key concepts: Silicon, Ion implantation, Materials science, Boron, Ion, Strained silicon, Semiconductor, Doping

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Ion implantation in semiconductors : proceedings of the II. International Conference on Ion Implantation in Semiconductors, Physics and Technology, Fundamental and Applied Aspects, May 24-28, 1971, Garmisch-Partenkirchen, Bavaria, Germany — Research Paper | ScholarLens