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2023•NanoscaleOpen access

Correction: Self-limiting stoichiometry in SnSe thin films

J Chin, Marshall B. Frye, Derrick Liu, Maria Hilse, Ian C. Graham, Jeffrey R. Shallenberger, Ke Wang, Roman Engel‐Herbert, Mengyi Wang, Yun Kyung Shin, Nadire Nayir, Adri C. T. van Duin, Lauren M. Garten

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Abstract

Correction for ‘Self-limiting stoichiometry in SnSe thin films’ by Jonathan R. Chin et al. , Nanoscale , 2023, 15 , 9973–9984, https://doi.org/10.1039/D3NR00645J.

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Correction for ‘Self-limiting stoichiometry in SnSe thin films’ by Jonathan R. Chin et al. , Nanoscale , 2023, 15 , 9973–9984, https://doi.org/10.1039/D3NR00645J.

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Available abstract

Correction for ‘Self-limiting stoichiometry in SnSe thin films’ by Jonathan R. Chin et al. , Nanoscale , 2023, 15 , 9973–9984, https://doi.org/10.1039/D3NR00645J.

Key concepts: Stoichiometry, Limiting, Self limiting, Materials science, Thin film, Nanotechnology, Chemical engineering, Chemistry

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