2001•Springer proceedings in physicsRequires access

Self-limiting etching prior to self-limiting growth in ultra-high vacuum for obtaining clean interface

Nobuyuki Otsuka, Jun‐ichi Nishizawa, Yutaka Oyama, Hiroaki Kikuchi, K. Sütö

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Key concepts: Limiting, Self limiting, Etching (microfabrication), Materials science, Interface (matter), Optoelectronics, Nanotechnology, Composite material