2005•Unpublished venueRequires access

Preparation and characterization of thin, atomically clean gallium nitride(0001) and aluminum nitride(0001) films and the deposition of thick gallium nitride films via iodine vapor phase growth

Will Mecouch

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Key concepts: Gallium nitride, Nitride, Materials science, Gallium, Characterization (materials science), Chemical vapor deposition, Deposition (geology), Thin film

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Preparation and characterization of thin, atomically clean gallium nitride(0001) and aluminum nitride(0001) films and the deposition of thick gallium nitride films via iodine vapor phase growth — Research Paper | ScholarLens