2020Unpublished venueRequires access

Analysis of wavefront aberration in a single collimating lens based dual-beam exposure system

Vunam Le, Guanhao Wu, Lijiang Zeng

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Abstract

We analyzed the interference wavefront aberration in a single collimating lens based dual-beam exposure system. A linear relationship between the aberration and pinholes’ position was obtained and a 0.03λ-aberration in 65mm×65mm area was achieved.

About this research paper

What this paper is about

We analyzed the interference wavefront aberration in a single collimating lens based dual-beam exposure system. A linear relationship between the aberration and pinholes’ position was obtained and a 0.03λ-aberration in 65mm×65mm area was achieved.

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Available abstract

We analyzed the interference wavefront aberration in a single collimating lens based dual-beam exposure system. A linear relationship between the aberration and pinholes’ position was obtained and a 0.03λ-aberration in 65mm×65mm area was achieved.

Key concepts: Wavefront, Optics, Collimated light, Lens (geology), Spherical aberration, Interference (communication), Adaptive optics, Beam (structure)

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