Analysis of wavefront aberration in a single collimating lens based dual-beam exposure system
Vunam Le, Guanhao Wu, Lijiang Zeng
Abstract
Vunam Le, Guanhao Wu, Lijiang Zeng
Abstract
We analyzed the interference wavefront aberration in a single collimating lens based dual-beam exposure system. A linear relationship between the aberration and pinholes’ position was obtained and a 0.03λ-aberration in 65mm×65mm area was achieved.
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We analyzed the interference wavefront aberration in a single collimating lens based dual-beam exposure system. A linear relationship between the aberration and pinholes’ position was obtained and a 0.03λ-aberration in 65mm×65mm area was achieved.
Key concepts: Wavefront, Optics, Collimated light, Lens (geology), Spherical aberration, Interference (communication), Adaptive optics, Beam (structure)