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Electrical and Material Characteristics of Low Pressure Chemical-Vapor Deposited Tungsten Films in Cold Wall Systems.

Rajiv Joshi

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Key concepts: Tungsten, Materials science, Chemical vapor deposition, Metallurgy, Composite material, Nanotechnology

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Electrical and Material Characteristics of Low Pressure Chemical-Vapor Deposited Tungsten Films in Cold Wall Systems. — Research Paper | ScholarLens