2020•IOP Conference Series Materials Science and EngineeringOpen access

Frictional behaviour of TiN coatings grown by atomic layer deposition

Wojciech Grodzicki, Łukasz Kołodziejczyk

Abstract

Abstract The main idea of the presented work is the evaluation of frictional properties of the TiN coatings deposited by atomic layer deposition technology using atomic force microscopy approach. Ogletree method was employed in order to calibrate the lateral force and estimate the average friction coefficient of TiN coatings. Obtained titanium nitride coatings were also characterized in terms of morphology, surface topography and mechanical properties. The evaluation has been done with reference to the commercially available TiN produced by commonly known magnetron sputtering method.

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Key concepts: Tin, Titanium nitride, Materials science, Deposition (geology), Layer (electronics), Sputter deposition, Sputtering, Metallurgy