Energy Deposition due to Secondary Particles in The Helical Undulator Wall at ILC-250GeV
Khaled Alharbi, Sabine Riemann, Ayash Alrashdi, Gudrid Moortgat‐Pick, Andriy Ushakov, .
Abstract
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Khaled Alharbi, Sabine Riemann, Ayash Alrashdi, Gudrid Moortgat‐Pick, Andriy Ushakov, .
Abstract
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In the future, International Linear Collider (ILC), a helical undulator based polarized positron source is expected to be chosen. A high energy electron beam passes through a superconducting helical undulator in order to create circularly polarized photons which will be directed to a conversion target, the result of which, will be electron-positron pairs. The resulting positron beam is longitudinally polarized. In order to produce the required number of positrons in ILC250 the full undulator length is needed. Since the photons are created with an opening angle and traveling through a 320 m long undulator, it is expected that the superconducting undulator vacuum will be hit by the photons. Photon masks are needed to be inserted in the undulator line to keep the power deposition in the vacuum below the acceptable limit which is 1W/m. A detailed study of the power deposition in the vacuum and masks is needed in order to design the photon masks. This paper describes the power deposition in the undulator vacuum due to secondary particles assuming an ideal undulator. In addition, the mask model is proposed.
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In the future, International Linear Collider (ILC), a helical undulator based polarized positron source is expected to be chosen. A high energy electron beam passes through a superconducting helical undulator in order to create circularly polarized photons which will be directed to a conversion target, the result of which, will be electron-positron pairs. The resulting positron beam is longitudinally polarized. In order to produce the required number of positrons in ILC250 the full undulator length is needed. Since the photons are created with an opening angle and traveling through a 320 m long undulator, it is expected that the superconducting undulator vacuum will be hit by the photons. Photon masks are needed to be inserted in the undulator line to keep the power deposition in the vacuum below the acceptable limit which is 1W/m. A detailed study of the power deposition in the vacuum and masks is needed in order to design the photon masks. This paper describes the power deposition in the undulator vacuum due to secondary particles assuming an ideal undulator. In addition, the mask model is proposed.
Key concepts: Undulator, International Linear Collider, Physics, Photon, Optics, Electron, Positron, Cathode ray