Junji Saraie, Seishi Goto, Yasunori Kitao, Yutaka Yodogawa
Abstract
Abstract A novel two‐step electron beam evaporation process has been developed, in which a very thin film is evaporated at 20 °C and the remaining part is evaporated subsequently at 250 °C without breaking the vacuum.
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Abstract A novel two‐step electron beam evaporation process has been developed, in which a very thin film is evaporated at 20 °C and the remaining part is evaporated subsequently at 250 °C without breaking the vacuum.
Key concepts: Chemistry, Evaporation, Vacuum evaporation, Process (computing), Thin film, Cathode ray, Electron beam physical vapor deposition, Chemical engineering