2018•Bulletin of the American Physical SocietyRequires access

Thermal Conductivity of amorphous and nanocrystalline silicon films prepared by hot-wire chemical-vapor deposition*

Xiao Liu, Battogtokh Jugdersuren, Brian T. Kearney, Daniel Queen, Thomas Metcalf, James C. Culbertson, Paul A. DeSario, R. M. Stroud, William Nemeth, Qi Wang

Open publisher page 0 citations

Abstract

This record does not include an abstract. Use the full-text link above if available.

About this research paper

What this paper is about

An abstract is not available in the OpenAlex record for this paper.

Why it matters

A significance statement is not available in the OpenAlex record.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Key concepts: Materials science, Chemical vapor deposition, Nanocrystalline material, Nanocrystalline silicon, Amorphous solid, Amorphous silicon, Chemical engineering, Thermal conductivity

Related papers

Back to paper searchBrowse research topicsOriginal source
Thermal Conductivity of amorphous and nanocrystalline silicon films prepared by hot-wire chemical-vapor deposition* — Research Paper | ScholarLens