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2019•Results in PhysicsOpen access

Design of four-layer tri-wavelength silica antireflective coatings with vector method containing absentee layer

Wensheng Lin, Xiaoyong Hu, Xueqing You, Lianghong Yan, Xinxiang Zhang, Hanxian Chen

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Abstract

A four-layer tri-wavelength silica antireflective (AR) coating with 100% transmittance simultaneously at 1064 nm, 532 nm and 355 nm was designed based on the vector method combined with absentee layer. The type of this AR coating is λ/2-λ/4-λ/2-λ/4 (λ 0 = 532 nm): 1.0|L A1 H A2|1.46 with n L = 1.19, n A1 = 1.31, n H = 1.44 and n A2 = 1.33.

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A four-layer tri-wavelength silica antireflective (AR) coating with 100% transmittance simultaneously at 1064 nm, 532 nm and 355 nm was designed based on the vector method combined with absentee layer. The type of this AR coating is λ/2-λ/4-λ/2-λ/4 (λ 0 = 532 nm): 1.0|L A1 H A2|1.46 with n L = 1.19, n A1 = 1.31, n H = 1.44 and n A2 = 1.33.

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Available abstract

A four-layer tri-wavelength silica antireflective (AR) coating with 100% transmittance simultaneously at 1064 nm, 532 nm and 355 nm was designed based on the vector method combined with absentee layer. The type of this AR coating is λ/2-λ/4-λ/2-λ/4 (λ 0 = 532 nm): 1.0|L A1 H A2|1.46 with n L = 1.19, n A1 = 1.31, n H = 1.44 and n A2 = 1.33.

Key concepts: Anti-reflective coating, Layer (electronics), Coating, Materials science, Wavelength, Transmittance, Optics, Thin layer

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