2018Unpublished venueRequires access

The Relationship between the Parameters of Vacuum Evaporation Process

Ivana Pelikanova Beshajova, Martin Molhanec

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Abstract

The work focuses on the problematic of thin layers prepared by the method of vacuum evaporation. The relationship between properties of deposited aluminium thin film layer and settings of starting parameters of deposition process was analysed. The theoretically calculated thickness of layers was compared with measured values of thickness. Influence of oxide layer that grows on surface aluminium layer was discussed too.

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What this paper is about

The work focuses on the problematic of thin layers prepared by the method of vacuum evaporation. The relationship between properties of deposited aluminium thin film layer and settings of starting parameters of deposition process was analysed. The theoretically calculated thickness of layers was compared with measured values of thickness. Influence of oxide layer that grows on surface aluminium layer was discussed too.

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Available abstract

The work focuses on the problematic of thin layers prepared by the method of vacuum evaporation. The relationship between properties of deposited aluminium thin film layer and settings of starting parameters of deposition process was analysed. The theoretically calculated thickness of layers was compared with measured values of thickness. Influence of oxide layer that grows on surface aluminium layer was discussed too.

Key concepts: Vacuum evaporation, Vacuum deposition, Aluminium, Evaporation, Layer (electronics), Materials science, Aluminium oxide, Deposition (geology)

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