2018•Applied Surface ScienceRequires access

Sub-30 nm patterning of molecular resists based on crosslinking through tip based oxidation

Matteo Lorenzoni, Daniel Wagner de Castro Lima Santos, Christian Neuber, Hans‐Werner Schmidt, Francesc Pérez‐Murano

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Key concepts: Resist, Lithography, Electron-beam lithography, Nanoimprint lithography, Materials science, Nanotechnology, Nanolithography, Next-generation lithography

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Sub-30 nm patterning of molecular resists based on crosslinking through tip based oxidation — Research Paper | ScholarLens