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2014•Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomenaRequires access

Spot Electron-Beam Lithography as a Novel Method of High Resolution Pattern Nanofabrication

Alexander S. Samardak, M. V. Anisimova, Alexey V. Ognev, Vadim Yu. Samardak, L. A. Chebotkevich

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Abstract

We present a novel method of pattern nanofabrication with high resolution and small shape defects using the traditional electron-beam lithography (EBL) or only a scanning electron microscope (SEM). Our method of Spot EBL is extremely fast, highly scalable on big areas, capable of sub-20 nm resolution and fabrication of polymer patterns with complicated shapes. We show the nanostructure images fabricated by Spot EBL and propose practical applications of the novel method.

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What this paper is about

We present a novel method of pattern nanofabrication with high resolution and small shape defects using the traditional electron-beam lithography (EBL) or only a scanning electron microscope (SEM). Our method of Spot EBL is extremely fast, highly scalable on big areas, capable of sub-20 nm resolution and fabrication of polymer patterns with complicated shapes. We show the nanostructure images fabricated by Spot EBL and propose practical applications of the novel method.

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Available abstract

We present a novel method of pattern nanofabrication with high resolution and small shape defects using the traditional electron-beam lithography (EBL) or only a scanning electron microscope (SEM). Our method of Spot EBL is extremely fast, highly scalable on big areas, capable of sub-20 nm resolution and fabrication of polymer patterns with complicated shapes. We show the nanostructure images fabricated by Spot EBL and propose practical applications of the novel method.

Key concepts: Nanolithography, Materials science, Electron-beam lithography, Stencil lithography, Lithography, Resolution (logic), X-ray lithography, Dip-pen nanolithography

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