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2018•Elsevier eBooksRequires access

Limits of Gate Dielectrics Scaling

Shahab Siddiqui, Takashi Ando, R. K. Pandey, Dominic J. Schepis

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Key concepts: Equivalent oxide thickness, Materials science, High-κ dielectric, Gate dielectric, Dielectric, Hafnium, Gate oxide, Optoelectronics

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