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A Study of Plasma-Induced Surface Roughness and Ripple Formation during Silicon Etching in Inductively Coupled Chlorine Plasmas

Nobuya Nakazaki

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Key concepts: Ripple, Etching (microfabrication), Inductively coupled plasma, Plasma, Silicon, Chlorine, Surface roughness, Materials science

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A Study of Plasma-Induced Surface Roughness and Ripple Formation during Silicon Etching in Inductively Coupled Chlorine Plasmas — Research Paper | ScholarLens