2016•Bulletin of the American Physical SocietyRequires access

Low Temperature Deposition of PECVD Polycrystalline Silicon Thin Films using SiF4 / SiH4 mixture

Moniruzzaman Syed, Takao Inokuma, Yoshihiro Kurata, Seiichi Hasegawa

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Key concepts: Plasma-enhanced chemical vapor deposition, Materials science, Polycrystalline silicon, Deposition (geology), Chemical engineering, Silicon, Crystallite, Chemical vapor deposition

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