Monolithic Integration of Trench Power JFET with Schottky Diode
Yang Gao, Jie Chen, Alex Q. Huang
Abstract
Yang Gao, Jie Chen, Alex Q. Huang
Abstract
A monolithic integration of trench power JFET with Schottky diode is proposed and analyzed. A unit JFET cell pitch of 1.1 um can be obtained. The specific on-resistance of the device is reduced to 14.4 mOmegamiddotmm2which is close to state-of-art of power MOSFET. Two approaches for the integrated Schottky diode -junction barrier Schottky (JBS) and planar Schottky diode (PSD) - are analyzed and compared. The integrated JBS diode shows 28% and 30% reduction while the integrated PSD shows 30% and 32% reduction on forward voltage drop and reverse recovery charge respectively compared with its p-n counterpart from the same integration technology
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A monolithic integration of trench power JFET with Schottky diode is proposed and analyzed. A unit JFET cell pitch of 1.1 um can be obtained. The specific on-resistance of the device is reduced to 14.4 mOmegamiddotmm2which is close to state-of-art of power MOSFET. Two approaches for the integrated Schottky diode -junction barrier Schottky (JBS) and planar Schottky diode (PSD) - are analyzed and compared. The integrated JBS diode shows 28% and 30% reduction while the integrated PSD shows 30% and 32% reduction on forward voltage drop and reverse recovery charge respectively compared with its p-n counterpart from the same integration technology
Key concepts: JFET, Schottky diode, Trench, Optoelectronics, Materials science, Schottky barrier, Diode, Electrical engineering