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Preparation and performance of Si microchannel plate

Q.D. Duanmu, Junfei Tian, Y Li, T. Dan, Yong Lu, Daqing Jiang, Lifeng Fu

Open publisher page 1 citations

Abstract

A silicon microchannel plate (Si-MCP), with 15-25 aspect ratio of the microchannel, 6-20 microns diameter and 6-8 microns space, was prepared by Inductively Coupled Plasma (ICP) and LPCVD. The inner surface topography of microchannel. was surveyed, the bulk resistance 7.3 mega ohm and electron gain 110 of MCP were tested by ultraviolet optoelectronic method. The plasma-etching lag in processing the microchannel array was analyzed and discussed. Finally, we compared the electron gain of silicon microchannel plate with traditional glass one. Our work proved the feasibility of making Si-MCP by microfabrication and semiconductor process.

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What this paper is about

A silicon microchannel plate (Si-MCP), with 15-25 aspect ratio of the microchannel, 6-20 microns diameter and 6-8 microns space, was prepared by Inductively Coupled Plasma (ICP) and LPCVD. The inner surface topography of microchannel. was surveyed, the bulk resistance 7.3 mega ohm and electron gain 110 of MCP were tested by ultraviolet optoelectronic method. The plasma-etching lag in processing the microchannel array was analyzed and discussed. Finally, we compared the electron gain of silicon microchannel plate with traditional glass one. Our work proved the feasibility of making Si-MCP by microfabrication and semiconductor process.

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Available abstract

A silicon microchannel plate (Si-MCP), with 15-25 aspect ratio of the microchannel, 6-20 microns diameter and 6-8 microns space, was prepared by Inductively Coupled Plasma (ICP) and LPCVD. The inner surface topography of microchannel. was surveyed, the bulk resistance 7.3 mega ohm and electron gain 110 of MCP were tested by ultraviolet optoelectronic method. The plasma-etching lag in processing the microchannel array was analyzed and discussed. Finally, we compared the electron gain of silicon microchannel plate with traditional glass one. Our work proved the feasibility of making Si-MCP by microfabrication and semiconductor process.

Key concepts: Microchannel, Microchannel plate detector, Microfabrication, Materials science, Silicon, Etching (microfabrication), Optoelectronics, Surface micromachining

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