2009•Cailiao daobaoRequires access

Advances in Research on Ferroelectric Thin Films and Ferroelectric Memory

Tang Minghua

Open publisher page 0 citations

Abstract

Ferroelectric thin films with ferroelectricity and the thickness ranging from nanometers to micrometers have attracted a great deal of attention for the potential applications in non-volatile ferroelectric random access memory(FeRAM).The preparation and modification of Bi4Ti3O12(BIT)-based ferroelectric films with lead-free chemical composition and excellent fatigue-free property and three failure mechanisms are analysed.The current research status of the ferroelectric memory are illustrated in this review.Finally future research direction on the ferroelectric thin films and ferroelectric memory are mentioned.

About this research paper

What this paper is about

Ferroelectric thin films with ferroelectricity and the thickness ranging from nanometers to micrometers have attracted a great deal of attention for the potential applications in non-volatile ferroelectric random access memory(FeRAM).The preparation and modification of Bi4Ti3O12(BIT)-based ferroelectric films with lead-free chemical composition and excellent fatigue-free property and three failure mechanisms are analysed.The current research status of the ferroelectric memory are illustrated in this review.Finally future research direction on the ferroelectric thin films and ferroelectric memory are mentioned.

Why it matters

A significance statement is not available in the OpenAlex record.

Key contribution

A contribution statement is not available in the OpenAlex record.

Method / approach

Method details are not available in the OpenAlex metadata.

Main findings

Findings are not separately available in the OpenAlex metadata.

Limitations

Limitations are not available in the OpenAlex metadata.

Applications

Application details are not available in the OpenAlex metadata.

Available abstract

Ferroelectric thin films with ferroelectricity and the thickness ranging from nanometers to micrometers have attracted a great deal of attention for the potential applications in non-volatile ferroelectric random access memory(FeRAM).The preparation and modification of Bi4Ti3O12(BIT)-based ferroelectric films with lead-free chemical composition and excellent fatigue-free property and three failure mechanisms are analysed.The current research status of the ferroelectric memory are illustrated in this review.Finally future research direction on the ferroelectric thin films and ferroelectric memory are mentioned.

Key concepts: Ferroelectricity, Ferroelectric RAM, Materials science, Non-volatile memory, Random access memory, Thin film, Nanotechnology, Nanometre

Related papers

Back to paper searchBrowse research topicsOriginal source
Advances in Research on Ferroelectric Thin Films and Ferroelectric Memory — Research Paper | ScholarLens