Jia Chengchang
Abstract
The general rules of metal-organic chemical vapor deposition(MOCVD) are introduced.The precursors and typical reactors apply to MOCVD are discussed.The recent progress and applications of MOCVD in compound semiconductor materials and thin film materials are reviewed.
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The general rules of metal-organic chemical vapor deposition(MOCVD) are introduced.The precursors and typical reactors apply to MOCVD are discussed.The recent progress and applications of MOCVD in compound semiconductor materials and thin film materials are reviewed.
Key concepts: Metalorganic vapour phase epitaxy, Chemical vapor deposition, Materials science, Combustion chemical vapor deposition, Metal, Nanotechnology, Deposition (geology), Thin film