Determination of boron,silicon,tungsten and manganese in high niobium titanium aluminum alloy by inductively coupled plasma atomic emission spectrometry
Gao Son
Abstract
Gao Son
Abstract
Determination of boron,silicon,tungsten and manganese in high niobium titanium aluminum alloy by inductively coupled plasma atomic emission spectrometry(ICP-AES)was achieved,with high-sensitivity spectral lines of boron,silicon,tungsten and manganese elements in high niobium titanium aluminum alloy as the analytical lines,with hydrochloric acid,hydrofluoric acid,nitric acid for dissolution of the sample,and the optimization of instrument working conditions.The low detection limits of the proposed method were 0.001μg/mL for B,0.002μg/mL for Si,W,0.000 1μg/mL for Mn,respectively.High niobium titanium aluminum alloy was used for addition recovery tests and the recoveries for the four elements were in the range of 95.2%-108%.The relative standard deviation of the sample determination results was less than 0.08 %.Titanium matrix reference materials were determined and the results were in line with the certified values.
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Determination of boron,silicon,tungsten and manganese in high niobium titanium aluminum alloy by inductively coupled plasma atomic emission spectrometry(ICP-AES)was achieved,with high-sensitivity spectral lines of boron,silicon,tungsten and manganese elements in high niobium titanium aluminum alloy as the analytical lines,with hydrochloric acid,hydrofluoric acid,nitric acid for dissolution of the sample,and the optimization of instrument working conditions.The low detection limits of the proposed method were 0.001μg/mL for B,0.002μg/mL for Si,W,0.000 1μg/mL for Mn,respectively.High niobium titanium aluminum alloy was used for addition recovery tests and the recoveries for the four elements were in the range of 95.2%-108%.The relative standard deviation of the sample determination results was less than 0.08 %.Titanium matrix reference materials were determined and the results were in line with the certified values.
Key concepts: Niobium, Titanium, Inductively coupled plasma, Tungsten, Materials science, Hydrofluoric acid, Nitric acid, Silicon