Next Generation Lithography and Equipment
Weng Shou-song
Abstract
Weng Shou-song
Abstract
The next generation lithography is the lithography technology of the ≤32 nm technology node. In this paper, the next generation lithography and equipment are introduced, consist of the x-ray lithography, the extreme ultraviolet lithography, the nanoimprint lithography and so on.
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The next generation lithography is the lithography technology of the ≤32 nm technology node. In this paper, the next generation lithography and equipment are introduced, consist of the x-ray lithography, the extreme ultraviolet lithography, the nanoimprint lithography and so on.
Key concepts: Lithography, Computational lithography, Extreme ultraviolet lithography, Next-generation lithography, Multiple patterning, X-ray lithography, Nanoimprint lithography, Immersion lithography