Trend of Photolithography Technology and Its Equipment in 21st Century
Su Xue
Abstract
Su Xue
Abstract
The limitation of photolithography technology and the trend of 193nm,157nm photolithography technology,SCALPEL,x ray photolithography,and IPL are analyzed in the article.The international brand named photolithography equipmemt and the ready to ship new generation of photolithography equipment are also introduced,and the current status of domestic photolithography equipmemt is briefly mentioned.
A significance statement is not available in the OpenAlex record.
A contribution statement is not available in the OpenAlex record.
Method details are not available in the OpenAlex metadata.
Findings are not separately available in the OpenAlex metadata.
Limitations are not available in the OpenAlex metadata.
Application details are not available in the OpenAlex metadata.
The limitation of photolithography technology and the trend of 193nm,157nm photolithography technology,SCALPEL,x ray photolithography,and IPL are analyzed in the article.The international brand named photolithography equipmemt and the ready to ship new generation of photolithography equipment are also introduced,and the current status of domestic photolithography equipmemt is briefly mentioned.
Key concepts: Photolithography, Computational lithography, Computer science, Engineering, Nanotechnology, Manufacturing engineering, Materials science, Resist