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Photolithography Pushing Forward to Nano-Fabrication

Liu Xuan-bo

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Abstract

Summarizing advances in light source,optics,illumination technology,mask design,Optical Proximity Correction(OPC)and stage during photolithography pushing forward to nano-fabrication,and describing photolithography advantages in mass production applications,introducing requirements for Next Generation Lithography(NGL),to predict prospects of photolithography.

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What this paper is about

Summarizing advances in light source,optics,illumination technology,mask design,Optical Proximity Correction(OPC)and stage during photolithography pushing forward to nano-fabrication,and describing photolithography advantages in mass production applications,introducing requirements for Next Generation Lithography(NGL),to predict prospects of photolithography.

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Available abstract

Summarizing advances in light source,optics,illumination technology,mask design,Optical Proximity Correction(OPC)and stage during photolithography pushing forward to nano-fabrication,and describing photolithography advantages in mass production applications,introducing requirements for Next Generation Lithography(NGL),to predict prospects of photolithography.

Key concepts: Photolithography, Computational lithography, Fabrication, Lithography, Nanotechnology, Extreme ultraviolet lithography, Materials science, Nano-

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