EFFECT OF ADSORPTION MODES ON THE PHOTOCATALYTIC DEGRADATION OF ORGANIC MATTERS 2. PHOTOCATALYTIC DEGRADATION PATHWAYSOF H-ACID ON TiO_ 2
Gang Pan
Abstract
Gang Pan
Abstract
H-acid adsorbed onto TiO_ 2 surface by sulphonic groups, which were first attacked by free radicals of OH_ ads followed by the cleavage of the naphthalene rings during the photo-degradation of H-acid on TiO_2 surfaces. At pH 2.5,H-acid adsorbed onto TiO_ 2 surface by one sulphonic group, which lead to a higher adsorption capacity but weaker adsorption bonds.Photo-degradation rates under this condition were therefore slower than at pH 5.0. At pH 5.0, H-acid adsorbed onto TiO_ 2 surface by two sulphonic groups, which had a lower adsorption capacity but stronger adsorption bonds. Photo-degradation rates were therefore faster than at pH 2.5. Different adsorption modes were the fundamental reason why the photocatalytic degradation pathways and degradation rates were different under different pH conditions.
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H-acid adsorbed onto TiO_ 2 surface by sulphonic groups, which were first attacked by free radicals of OH_ ads followed by the cleavage of the naphthalene rings during the photo-degradation of H-acid on TiO_2 surfaces. At pH 2.5,H-acid adsorbed onto TiO_ 2 surface by one sulphonic group, which lead to a higher adsorption capacity but weaker adsorption bonds.Photo-degradation rates under this condition were therefore slower than at pH 5.0. At pH 5.0, H-acid adsorbed onto TiO_ 2 surface by two sulphonic groups, which had a lower adsorption capacity but stronger adsorption bonds. Photo-degradation rates were therefore faster than at pH 2.5. Different adsorption modes were the fundamental reason why the photocatalytic degradation pathways and degradation rates were different under different pH conditions.
Key concepts: Adsorption, Photocatalysis, Chemistry, Degradation (telecommunications), Naphthalene, Radical, Photochemistry, Humic acid