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2008•Chinese Journal of Analysis LaboratoryRequires access

Determination of 28 trace impurities in high purity tantalum oxide by inductively coupled plasma mass spectrometry

Peng Guo

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Abstract

An ICP-MS method is proposed for the determination of 28 trace impurity elements in high purity tantalum oxide.The mass spectral interference and interface effect were discussed.The matrix effect was suppressed by standard addition method.The detection limits for impurities are 0.001～0.1 μg/g,The recoveries of standard addition are 90%～115%.The method has been applied to the determination of trace impurities in high purity tantalum oxide with purity of 99.999%.

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What this paper is about

An ICP-MS method is proposed for the determination of 28 trace impurity elements in high purity tantalum oxide.The mass spectral interference and interface effect were discussed.The matrix effect was suppressed by standard addition method.The detection limits for impurities are 0.001～0.1 μg/g,The recoveries of standard addition are 90%～115%.The method has been applied to the determination of trace impurities in high purity tantalum oxide with purity of 99.999%.

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Available abstract

An ICP-MS method is proposed for the determination of 28 trace impurity elements in high purity tantalum oxide.The mass spectral interference and interface effect were discussed.The matrix effect was suppressed by standard addition method.The detection limits for impurities are 0.001～0.1 μg/g,The recoveries of standard addition are 90%～115%.The method has been applied to the determination of trace impurities in high purity tantalum oxide with purity of 99.999%.

Key concepts: Chemistry, Impurity, Tantalum, Inductively coupled plasma mass spectrometry, Oxide, Analytical Chemistry (journal), Mass spectrometry, Detection limit

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