Deposition Condition Investigation of High c-axis Preferred Orientation ZnO Films Produced by RF Magnetron Sputtering

The zinc oxide(ZnO) thin films were deposited on Si(100) substrate by RF magnetron sputtering technique from a ZnO ceramic target.This paper discussed the relationship of microstructure,surface morphology and preferred orientation with the deposition parameters,such as substrate temperature,oxygen partial pressure,and final annealing treatment,etc.It was found that the preferred orientation and microstructure of ZnO films were strongly affected by the sputtering and annealing condition.The optimum conditions of RF sputtering were also studied in detail.Based on the conditions obtained,an excellent ZnO films with high c-axis orientation has been realized.