Effect of parameter of magnetron sputtering on microstructure and properties of nanoscale ZrB_2/ZrAlN multilayered films

A series of nanoscale ZrB2/ZrAlN multilayered films were prepared with ZrB2 and ZrAlN as individual layered materials by using ultra-high vacuum radio frequency magnetron sputter system at the modulation period of 80 nm.The phase and crystal structures of the films were analyzed by using XRD,profiler and nano indenter.The results showed that the properties of the multilayered films changed with the Ar/N2 flow ratio.The multilayered films exhibited higher nanohardness and elastic modulus than the rule-of-mixture value of monolithic ZrB2 and ZrAlN films,and the residual stress was also released.The mechanical properties of the multilayered films reached optimal at proper N2 partial pressure.