2004•Nuclear TechniquesRequires access
Key technology of mask making for 50 nm X-ray lithography
Tianchun Ye, Jufang Zhang
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Abstract
The X-ray lithography of 1 nm wavelength is a step lithography. Compared to other next-generation lithography alternatives, the X-ray lithography can improve resolution, depth of focus, and exposure field sizes simultaneously. Another key advantage is the low cost. As the most difficult part of the X-ray lithography, the mask making technology for 50 nm X-ray lithography was discussed in this paper.