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Electroless Ni-P Plating on Glass Substrates

Xuanjun Wang

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Abstract

An improved technology process of bright Ni-P electroless plating on glass surface was gained by adjusting process parameters such as bath composition,temperature,pH value and plating time.The effects of phosphorus content in the plating and surface properties of glass on the brightness and adhesion of the Ni-P plating were analysed.The results of performance measurements show that the Ni-P plating has excellent brightness and adhesion,and the phosphorus content in the plating was 10%～11%.

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What this paper is about

An improved technology process of bright Ni-P electroless plating on glass surface was gained by adjusting process parameters such as bath composition,temperature,pH value and plating time.The effects of phosphorus content in the plating and surface properties of glass on the brightness and adhesion of the Ni-P plating were analysed.The results of performance measurements show that the Ni-P plating has excellent brightness and adhesion,and the phosphorus content in the plating was 10%～11%.

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Available abstract

An improved technology process of bright Ni-P electroless plating on glass surface was gained by adjusting process parameters such as bath composition,temperature,pH value and plating time.The effects of phosphorus content in the plating and surface properties of glass on the brightness and adhesion of the Ni-P plating were analysed.The results of performance measurements show that the Ni-P plating has excellent brightness and adhesion,and the phosphorus content in the plating was 10%～11%.

Key concepts: Plating (geology), Materials science, Metallurgy, Adhesion, Electroless plating, Phosphorus, Composite material, Layer (electronics)

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