Determination of Trace-amounts of Chloride ion in Acidic-Copper Plating Solution by Ion Chromatography
HU Rong-Zong
Abstract
HU Rong-Zong
Abstract
In this paper, the quantitative method for trace amounts of chloride ion in acidiccopper plating solution by ion chromatography is described. The acidiccopper plating solution contains large amounts of SO 4 2- and Cu 2+ , and trace amounts of chloride ion and so on. To minimize the interfering by sulfate ion and to avoid the damage to anionseparator column by copper ion, a pretreatment using barium carbonate as precipitator is required. Samples were separated completely by this system. The experiment results indicate that the pretreatment method is successful and determination for chloride ion is sensitive and accurate.
A significance statement is not available in the OpenAlex record.
A contribution statement is not available in the OpenAlex record.
Method details are not available in the OpenAlex metadata.
Findings are not separately available in the OpenAlex metadata.
Limitations are not available in the OpenAlex metadata.
Application details are not available in the OpenAlex metadata.
In this paper, the quantitative method for trace amounts of chloride ion in acidiccopper plating solution by ion chromatography is described. The acidiccopper plating solution contains large amounts of SO 4 2- and Cu 2+ , and trace amounts of chloride ion and so on. To minimize the interfering by sulfate ion and to avoid the damage to anionseparator column by copper ion, a pretreatment using barium carbonate as precipitator is required. Samples were separated completely by this system. The experiment results indicate that the pretreatment method is successful and determination for chloride ion is sensitive and accurate.
Key concepts: Chloride, Ion chromatography, Chemistry, Plating (geology), Barium chloride, Copper, Sulfate, Ion