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13.5 GHz f_T SiGe Heterojunction Bipolar Transistor Fabricated by Planar Technology

Jia Chuan Lin, Yongkang Li

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Abstract

A planar SiGe heterojunction bipolar transistor was fabricated using polysilicon emitter technology and SiGe base grown by Molecular Beam Epitaxy (MBE).The SiGe HBT ( S e=3?μm×8?μm) has a current gain β of 30 to 50,an emitter collector breakdown voltage BV CEO of 5?V,the maximum cutoff frequency f T of 13.5?GHz at room temperature.

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A planar SiGe heterojunction bipolar transistor was fabricated using polysilicon emitter technology and SiGe base grown by Molecular Beam Epitaxy (MBE).The SiGe HBT ( S e=3?μm×8?μm) has a current gain β of 30 to 50,an emitter collector breakdown voltage BV CEO of 5?V,the maximum cutoff frequency f T of 13.5?GHz at room temperature.

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Available abstract

A planar SiGe heterojunction bipolar transistor was fabricated using polysilicon emitter technology and SiGe base grown by Molecular Beam Epitaxy (MBE).The SiGe HBT ( S e=3?μm×8?μm) has a current gain β of 30 to 50,an emitter collector breakdown voltage BV CEO of 5?V,the maximum cutoff frequency f T of 13.5?GHz at room temperature.

Key concepts: Heterojunction bipolar transistor, Common emitter, Optoelectronics, Materials science, Bipolar junction transistor, Molecular beam epitaxy, Heterojunction, Cutoff frequency

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