Principle of electron beam lithography and its application on the nanofabrication and nanodevice

Electron beam lithography(EBL) is one of the most important techniques in the area of the microelectronics for its ability of creating various patterns with the feature size of less than 10nm.It also has a great application on the nanotechnology,such as the nanofabrication,the characterization of nanostructures,and the realization of nanodevice.In this paper,we briefly reviewed the principle of the EBL and some key issues of the EBL process.The capabilities of EBL on the nanofabrication and the nanodevice were also illustrated from some recently achievements from the published references.