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2016•Nuclear Science and TechniquesRequires access

Study of doping uniformity of a 200 kV ion implanter by RBS and sheet resistance measurements

Hui Li, Ze-Song Wang, Shengjun Zhang, Vasiliy Pelenovich, Feng Ren, Dejun Fu, Chuan-Sheng Liu, Zhiwei Ai

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Key concepts: Ion implantation, Sheet resistance, Materials science, Dopant, Ion, Calibration, Doping, Spreading resistance profiling

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Study of doping uniformity of a 200 kV ion implanter by RBS and sheet resistance measurements — Research Paper | ScholarLens