Improvement of Pressure Stability in a Vacuum Chamber with h-BN/Cu Coating
Tetsuo Oishi, Y. Konishi, Masahiro Goto, Akira Kasahara, Masahiro Tosa, Kazuhiro Yoshihara
Abstract
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Tetsuo Oishi, Y. Konishi, Masahiro Goto, Akira Kasahara, Masahiro Tosa, Kazuhiro Yoshihara
Abstract
Open-access reader
In order to improve the pressure stability, h-BN/Cu complex film was coated by magnetron co-sputtering deposition inside a vacuum chamber in the shape of a cylinder, and the pressure stability in this chamber was measured by a buildup method. The pressure in the h-BN/Cu coated vacuum chamber increased from 1.0 × 10-8 Pa to 1.6 × 10-5 Pa through 24 hours. This pressure was two orders lower than that of non-coated vacuum chamber with the same shape as the h-BN/Cu coated vacuum chamber. The outgassing rate calculated from the slope of the pressure increase curve was about 5 × 10-12 Pa·m·s-1, which explains that this h-BN/Cu coating is effective to an improvement of the pressure stability in a vacuum chamber.
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In order to improve the pressure stability, h-BN/Cu complex film was coated by magnetron co-sputtering deposition inside a vacuum chamber in the shape of a cylinder, and the pressure stability in this chamber was measured by a buildup method. The pressure in the h-BN/Cu coated vacuum chamber increased from 1.0 × 10-8 Pa to 1.6 × 10-5 Pa through 24 hours. This pressure was two orders lower than that of non-coated vacuum chamber with the same shape as the h-BN/Cu coated vacuum chamber. The outgassing rate calculated from the slope of the pressure increase curve was about 5 × 10-12 Pa·m·s-1, which explains that this h-BN/Cu coating is effective to an improvement of the pressure stability in a vacuum chamber.
Key concepts: Outgassing, Vacuum chamber, Chamber pressure, Materials science, Ultra-high vacuum, Coating, Vacuum arc, Sputtering