Improved Bias Stability of Solution-Processed ZnSnO Thin-Film Transistors by Zr Addition
You Seung Rim, D. L. Kim, Woong Hee Jeong, Hyun Jae Kim
Abstract
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You Seung Rim, D. L. Kim, Woong Hee Jeong, Hyun Jae Kim
Abstract
Open-access reader
We investigated the effect of adsorption of specific molecules on undoped zinc tin oxide (ZTO) and zirconium (Zr)-doped zinc tin oxide (ZZTO) thin-film transistors (TFTs) using a solution process. The specific chemisorbed species on the back channel region produced unstable ZTO TFT electrical properties under a bias stress test. However, the amount of specific chemisorbed ZTO TFT species could be controlled by Zr doping. As a result, the threshold voltage shift of the ZZTO TFT was dramatically improved comparing the ZTO TFT under positive bias stress.
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We investigated the effect of adsorption of specific molecules on undoped zinc tin oxide (ZTO) and zirconium (Zr)-doped zinc tin oxide (ZZTO) thin-film transistors (TFTs) using a solution process. The specific chemisorbed species on the back channel region produced unstable ZTO TFT electrical properties under a bias stress test. However, the amount of specific chemisorbed ZTO TFT species could be controlled by Zr doping. As a result, the threshold voltage shift of the ZZTO TFT was dramatically improved comparing the ZTO TFT under positive bias stress.
Key concepts: Thin-film transistor, Materials science, Doping, Threshold voltage, Tin, Solution process, Zirconium, Stress (linguistics)