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Metal Oxide Conductivity and Nanomechanical Properties of ZnO/Mo/ZnO Multilayer Thin Films Deposited By RF Magnetron Sputtering

Shihao Wang, Yu‐Jen Hsiao, Te‐Hua Fang

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Abstract

The structural, optical, electrical, and nanomechanical properties of zinc oxide (ZnO/Mo/ZnO) trilayer films was investigated using X-ray diffraction, atomic force microscopy, ultraviolet-visible spectroscopy, sheet resistance measurements, and nanoindentation techniques. It was found that the transparency, sheet resistance, and nanoindentation of the trilayer films depend on the Mo layer thickness and the annealing temperature. Sheet resistance of the ZnO/Mo/ZnO multilayer films decreased with the increase of Mo thickness and the increase of the annealing temperature. Figure 1

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The structural, optical, electrical, and nanomechanical properties of zinc oxide (ZnO/Mo/ZnO) trilayer films was investigated using X-ray diffraction, atomic force microscopy, ultraviolet-visible spectroscopy, sheet resistance measurements, and nanoindentation techniques. It was found that the transparency, sheet resistance, and nanoindentation of the trilayer films depend on the Mo layer thickness and the annealing temperature. Sheet resistance of the ZnO/Mo/ZnO multilayer films decreased with the increase of Mo thickness and the increase of the annealing temperature. Figure 1

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Available abstract

The structural, optical, electrical, and nanomechanical properties of zinc oxide (ZnO/Mo/ZnO) trilayer films was investigated using X-ray diffraction, atomic force microscopy, ultraviolet-visible spectroscopy, sheet resistance measurements, and nanoindentation techniques. It was found that the transparency, sheet resistance, and nanoindentation of the trilayer films depend on the Mo layer thickness and the annealing temperature. Sheet resistance of the ZnO/Mo/ZnO multilayer films decreased with the increase of Mo thickness and the increase of the annealing temperature. Figure 1

Key concepts: Nanoindentation, Materials science, Sheet resistance, Annealing (glass), Sputter deposition, Thin film, Cavity magnetron, Optoelectronics

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