2015Unpublished venueRequires access

Optical properties research of a - Si thin film by electron beam evaporation

Zhuang Qiuhui, Guojun Liu, Xiuhua Fu, Zi Ma

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Abstract

Optical properties of optical thin film is the basis of the design and preparation of thin films. this paper studied the basal temperature, vacuum degree of work and deposition rate of a - Si thin film optical constants through test. Results showed that the substrate temperature is 150 and the deposition rate is 0.5 nm/s, can get optical performance more optimized a - Si optical thin film.

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What this paper is about

Optical properties of optical thin film is the basis of the design and preparation of thin films. this paper studied the basal temperature, vacuum degree of work and deposition rate of a - Si thin film optical constants through test. Results showed that the substrate temperature is 150 and the deposition rate is 0.5 nm/s, can get optical performance more optimized a - Si optical thin film.

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Available abstract

Optical properties of optical thin film is the basis of the design and preparation of thin films. this paper studied the basal temperature, vacuum degree of work and deposition rate of a - Si thin film optical constants through test. Results showed that the substrate temperature is 150 and the deposition rate is 0.5 nm/s, can get optical performance more optimized a - Si optical thin film.

Key concepts: Thin film, Electron beam physical vapor deposition, Materials science, Evaporation, Substrate (aquarium), Deposition (geology), Vacuum evaporation, Optoelectronics

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