2007•Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and AtomsRequires access

Hydrogen silsesquioxane a next generation resist for proton beam writing at the 20nm level

J.A. van Kan, Andrew A. Bettiol, F. Watt

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Key concepts: Resist, Hydrogen silsesquioxane, Proton, Materials science, Beam (structure), Electron-beam lithography, Optoelectronics, Nanotechnology

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Hydrogen silsesquioxane a next generation resist for proton beam writing at the 20nm level — Research Paper | ScholarLens