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2011•Microelectronic EngineeringOpen access

Sub-5keV electron-beam lithography in hydrogen silsesquioxane resist

Vitor R. Manfrinato, Lin Lee Cheong, Huigao Duan, Donald Winston, Henry I. Smith, Karl K. Berggren

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Key concepts: Resist, Hydrogen silsesquioxane, Electron-beam lithography, Materials science, Lithography, Silsesquioxane, Cathode ray, Electron

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