Layer‐by‐Layer Interference Lithography of Three‐dimensional Microstructures in SU‐8
Andrés Fabián Lasagni, Dajun Yuan, Suman Das
Abstract
Andrés Fabián Lasagni, Dajun Yuan, Suman Das
Abstract
We report on rapid fabrication of two-, two and a half-, and 3D planar periodic structures using layer-by-layer deposition and interference patterning of SU-8 photoresist. Complex structures with non-periodic vertical symmetry were fabricated controlling the cure depth by addition of a UV absorber. The fabrication method reported here can be applied for the high-volume manufacturing of solid structures for microelectromechanical systems and microfluidic devices.
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We report on rapid fabrication of two-, two and a half-, and 3D planar periodic structures using layer-by-layer deposition and interference patterning of SU-8 photoresist. Complex structures with non-periodic vertical symmetry were fabricated controlling the cure depth by addition of a UV absorber. The fabrication method reported here can be applied for the high-volume manufacturing of solid structures for microelectromechanical systems and microfluidic devices.
Key concepts: Fabrication, Photoresist, Materials science, Interference lithography, Layer (electronics), Lithography, Planar, Interference (communication)