2011IEEE Transactions on Device and Materials ReliabilityRequires access

Single-Event Transient Measurements in nMOS and pMOS Transistors in a 65-nm Bulk CMOS Technology at Elevated Temperatures

Matthew J. Gadlage, Jonathan R. Ahlbin, Balaji Narasimham, B. L. Bhuva, L. W. Massengill, Ronald D. Schrimpf

Open publisher page 42 citations

Abstract

In this paper, heavy-ion-induced single-event transient (SET) pulsewidths measured in a 65-nm bulk CMOS technology at temperatures ranging from 25°C to 100°C with an autonomous SET capture circuit are presented. The experimental results for the SETs induced in two different inverter chain circuits indicate an increase in the average SET pulsewidth as a function of the operating temperature. Unique SET test structures were also designed to differentiate between SETs induced in an nMOS transistor and those induced in a pMOS transistor. The SET widths induced in a pMOS transistor increase more with temperature than the SETs induced in an nMOS transistor.

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What this paper is about

In this paper, heavy-ion-induced single-event transient (SET) pulsewidths measured in a 65-nm bulk CMOS technology at temperatures ranging from 25°C to 100°C with an autonomous SET capture circuit are presented. The experimental results for the SETs induced in two different inverter chain circuits indicate an increase in the average SET pulsewidth as a function of the operating temperature. Unique SET test structures were also designed to differentiate between SETs induced in an nMOS transistor and those induced in a pMOS transistor. The SET widths induced in a pMOS transistor increase more with temperature than the SETs induced in an nMOS transistor.

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Available abstract

In this paper, heavy-ion-induced single-event transient (SET) pulsewidths measured in a 65-nm bulk CMOS technology at temperatures ranging from 25°C to 100°C with an autonomous SET capture circuit are presented. The experimental results for the SETs induced in two different inverter chain circuits indicate an increase in the average SET pulsewidth as a function of the operating temperature. Unique SET test structures were also designed to differentiate between SETs induced in an nMOS transistor and those induced in a pMOS transistor. The SET widths induced in a pMOS transistor increase more with temperature than the SETs induced in an nMOS transistor.

Key concepts: NMOS logic, PMOS logic, Transistor, CMOS, Inverter, Materials science, Transient (computer programming), MOSFET

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