2-µm Gate-length enhancement mode InGaAs/InP:Fe-JFET's with high transconductance
H. Albrecht, J. Bittnar, Ch. Lauterbach
Abstract
H. Albrecht, J. Bittnar, Ch. Lauterbach
Abstract
Investigations of enhancement mode InGaAs junction field-effect transistors (JFET's) grown on InP:Fe-substrate by liquid-phase epitaxy (LPE) are reported. The JFET's with 2-µm gate length and 190- µm gate width show a threshold voltage of 0.4 V, a low drain current of < 10 µA at 0-V gate-source voltage and a maximum transconductance of 105 mS/mm. The measured transconductances of enhancement mode InGaAs/InP:Fe JFET's with different gate lengths but with the same gate width and threshold voltage decrease proportional to the inverse gate length as expected from a constant drift mobility FET model.
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Investigations of enhancement mode InGaAs junction field-effect transistors (JFET's) grown on InP:Fe-substrate by liquid-phase epitaxy (LPE) are reported. The JFET's with 2-µm gate length and 190- µm gate width show a threshold voltage of 0.4 V, a low drain current of < 10 µA at 0-V gate-source voltage and a maximum transconductance of 105 mS/mm. The measured transconductances of enhancement mode InGaAs/InP:Fe JFET's with different gate lengths but with the same gate width and threshold voltage decrease proportional to the inverse gate length as expected from a constant drift mobility FET model.
Key concepts: JFET, Transconductance, Materials science, Optoelectronics, Field-effect transistor, Threshold voltage, Gallium arsenide, Electrical engineering