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1997•MRS ProceedingsOpen access

Silicon Nitride Films Deposited by Atmospheric Pressure Chemical Vapor Deposition

Xian Lin, D. Endisch, Xiaomeng Chen, Alain E. Kaloyeros

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Key concepts: Materials science, Chemical vapor deposition, Plasma-enhanced chemical vapor deposition, Combustion chemical vapor deposition, Silicon nitride, Deposition (geology), Hybrid physical-chemical vapor deposition, Silicon

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