High photoluminescence quantum efficiency InGaN multiple quantum well structures emitting at 380nm

In this paper we report the design of high room temperature photoluminescence internal efficiency InGaN-based quantum well structures emitting in the near ultraviolet at 380nm. To counter the effects of nonradiative recombination the quantum wells were designed to have a large indium fraction, high barriers, and a small quantum well thickness. To minimize the interwell and interbarrier thickness fluctuations we used Al0.2In0.005Ga0.795N barriers, where the inclusion of the small fraction of indium was found to lead to fewer structural defects and a reduction in the layer thickness fluctuations. This approach has led us to achieve, for an In0.08Ga0.92N∕Al0.2In0.005Ga0.795N multiple quantum well structure with a well width of 1.5nm, a photoluminescence internal efficiency of 67% for peak emission at 382nm at room temperature.