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2007•Conference proceedings. ... International Conference on Indium Phosphide and Related MaterialsRequires access

Surface Roughness Measurements on Semiconductors Using White Light Interferometry

R. Blunt

Open publisher page 2 citations

Abstract

The use of White Light Interferometry to directly measure surface roughness on a variety of substrates and epitaxially grown materials is described. This method has many advantages for process development and monitoring compared to competing technologies as it offers the ability to rapidly image surfaces and to produce quantitative values for roughness without contacting the surface or damaging it any way.

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What this paper is about

The use of White Light Interferometry to directly measure surface roughness on a variety of substrates and epitaxially grown materials is described. This method has many advantages for process development and monitoring compared to competing technologies as it offers the ability to rapidly image surfaces and to produce quantitative values for roughness without contacting the surface or damaging it any way.

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Available abstract

The use of White Light Interferometry to directly measure surface roughness on a variety of substrates and epitaxially grown materials is described. This method has many advantages for process development and monitoring compared to competing technologies as it offers the ability to rapidly image surfaces and to produce quantitative values for roughness without contacting the surface or damaging it any way.

Key concepts: White light interferometry, Interferometry, Surface roughness, Surface finish, Materials science, Optics, White light, Optoelectronics

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