1998•Quality and Reliability Engineering InternationalRequires access

Run-to-run control charts with contrasts

George C. Runger, John Fowler

Abstract

In semiconductor manufacturing it is useful to design control charts to be sensitive to anticipated assignable causes. Process knowledge can be used to develop summaries for run-to-run control that are more sensitive to problems than traditional approaches. As the number of measurements recorded from a run increases, appropriate summaries derived from process knowledge become more important. Control charts based on linear contrasts are generated from partitions of a standard analysis of variance model. These contrasts simplify the development and interpretation of charts sensitized for specific assignable causes. The use of EWMA control charts for these statistics is described. © 1998 John Wiley & Sons, Ltd.

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Key concepts: Control chart, EWMA chart, Statistical process control, Shewhart individuals control chart, Computer science, Variance (accounting), Control (management), Process (computing)