Comparison study of LDMOS and VDMOS technologies for RF power amplifiers
Bandaru Venkata Ramarao, Jitendra Kumar Mishra, Manjiri M. Pande, Prabjit Singh, Gande Arun Kumar, Jayanta Mukherjee
Abstract
Bandaru Venkata Ramarao, Jitendra Kumar Mishra, Manjiri M. Pande, Prabjit Singh, Gande Arun Kumar, Jayanta Mukherjee
Abstract
Two RF power MOSFETs of equal power rating and operating frequency in two different technologies one in Laterally Diffused MOS (LDMOS) and another in Vertically Diffused MOS (VDMOS) have been used to study the RF performances. Power amplifiers have been simulated and experimented using these technologies. Performance comparison has been made between these two types of RF power amplifiers. Amplifier built over LDMOS has higher gain and efficiency compared to amplifier built with VDMOS.
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Two RF power MOSFETs of equal power rating and operating frequency in two different technologies one in Laterally Diffused MOS (LDMOS) and another in Vertically Diffused MOS (VDMOS) have been used to study the RF performances. Power amplifiers have been simulated and experimented using these technologies. Performance comparison has been made between these two types of RF power amplifiers. Amplifier built over LDMOS has higher gain and efficiency compared to amplifier built with VDMOS.
Key concepts: LDMOS, Amplifier, RF power amplifier, Electrical engineering, Radio frequency, Power (physics), Power MOSFET, Current sense amplifier