Through-Silicon-Via assignment for 3D ICs
Jianchang Ao, Sheqin Dong, Song Chen, Satoshi Goto
Abstract
Jianchang Ao, Sheqin Dong, Song Chen, Satoshi Goto
Abstract
Three-dimensional integrated circuits (3D ICs) can alleviate the interconnect problem coming with the decreasing feature size and increasing integration density, and promise a solution to heterogeneous integration. The inter-layer connection, which is generally implemented by the Through-Silicon-Via (TSV), is a key technology for 3D ICs. In this paper, we propose a unified simulated annealing technology to tackle the TSV assignment problem, including the signal TSV assignment of 3D nets and 3D buses. The experiment results show the effective of the method.
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Three-dimensional integrated circuits (3D ICs) can alleviate the interconnect problem coming with the decreasing feature size and increasing integration density, and promise a solution to heterogeneous integration. The inter-layer connection, which is generally implemented by the Through-Silicon-Via (TSV), is a key technology for 3D ICs. In this paper, we propose a unified simulated annealing technology to tackle the TSV assignment problem, including the signal TSV assignment of 3D nets and 3D buses. The experiment results show the effective of the method.
Key concepts: Through-silicon via, Three-dimensional integrated circuit, Interconnection, Simulated annealing, Computer science, Key (lock), Integrated circuit, Signal integrity